A new methodology to anchor 𝜆-DNA to silanized 𝑛-Si(111) surface using Langmuir Blodget trough was developed. The 𝑛-Si (111) was silanized by treating it with low molecular weight octyltrichlorosilane in toluene. Scanning tunneling microscopy (STM) image of 𝜆-DNA on octyltrichlorosilane deposited Si substrate shows areas exhibiting arrayed structures of 700 nm length and 40 nm spacing. Scanning tunneling spectroscopy (STS) at different stages depict a broad distribution of defect states in the bandgap region of 𝑛-Si(111) which presumably facilitates tunneling through otherwise insulating DNA layer.
Volume 42 | Issue 2