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      https://www.ias.ac.in/article/fulltext/boms/031/03/0309-0312

    • Keywords

       

      DNA; scanning tunneling microscopy; Langmuir Blodget technique; silanization.

    • Abstract

       

      A new methodology to anchor 𝜆-DNA to silanized 𝑛-Si(111) surface using Langmuir Blodget trough was developed. The 𝑛-Si (111) was silanized by treating it with low molecular weight octyltrichlorosilane in toluene. Scanning tunneling microscopy (STM) image of 𝜆-DNA on octyltrichlorosilane deposited Si substrate shows areas exhibiting arrayed structures of 700 nm length and 40 nm spacing. Scanning tunneling spectroscopy (STS) at different stages depict a broad distribution of defect states in the bandgap region of 𝑛-Si(111) which presumably facilitates tunneling through otherwise insulating DNA layer.

    • Author Affiliations

       

      Shirshendu Dey1 Sushama Pethkar2 Suguna D Adyanthaya2 Murali Sastry3 C V Dharmadhikari1

      1. DST Unit of Nanoscience and Centre of Advanced Studies in Materials Science and Solid State Physics, Department of Physics, University of Pune, Pune 411 007, India
      2. Nanoscience Group, Materials Chemistry Division, National Chemical Laboratory, Pune 411 008, India
      3. Tata Chemicals Limited, Leela Business Park, Andheri-Kurla Road, Andheri (E), Mumbai 400 059, India
    • Dates

       
  • Bulletin of Materials Science | News

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