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      Permanent link:
      https://www.ias.ac.in/article/fulltext/boms/029/06/0573-0580

    • Keywords

       

      Co-ferrite films; high coercivity; nanostructured.

    • Abstract

       

      Three methods including sol–gel, rf sputtering and pulsed laser deposition (PLD) have been used for the fabrication of high coercivity Co-ferrite thin films with a nanocrystalline structure. The PLD method is demonstrated to be a possible tool to achieve Co-ferrite films with high coercivity and small grain size at low deposition temperature. High coercivity, over 10 kOe, has been successfully achieved in Co-ferrite films with a thickness of ∼ 100 nm deposited using PLD with a substrate temperature at 550°C. The Co-ferrite films prepared by PLD at over 300°C on different substrates including amorphous glass, quartz and silicon exhibits an obvious (111) textured structure and possesses perpendicular anisotropy. Our study has also shown that the high coercivity is related with a large residual strain, which may induce an additional magnetic anisotropy (stress anisotropy) and at the same time serve as pinning centres, which can restrict the domain wall movement and therefore, increase the coercivity.

    • Author Affiliations

       

      J H Yin1 B H Liu1 J Ding1 Y C Wang1

      1. Department of Materials Science and Engineering, National University of Singapore, 119260 Singapore
    • Dates

       

© 2017-2019 Indian Academy of Sciences, Bengaluru.