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      https://www.ias.ac.in/article/fulltext/boms/027/03/0303-0316

    • Keywords

       

      Photoresists; lithographic performance; novolac resins; NMR.

    • Abstract

       

      Applications of improved 1-D/ 2-D NMR spectroscopic techniques have been reviewed for quantitatively estimating the incorporation of different monomers and degree of linearity in resin microstructure. Comparison of the NMR data with those from lithography leads to a distinct correlation between resin microstructure and lithographic performance. A novel photoresist mechanism is proposed in a positive photoresist; also, using modern NMR techniques, the crosslinking mechanism in a negative photoresist has been studied.

    • Author Affiliations

       

      Debmalya Roy1 P K Basu1 P Raghunathan2 S V Eswaran3

      1. Solid State Physics Laboratory, Lucknow Road, Delhi 110 054, India
      2. Fluorosis Research Foundation, 34, I.P. Extension, Delhi 110 092, India
      3. St. Stephen’s College, University of Delhi, Delhi 110 007, India
    • Dates

       
  • Bulletin of Materials Science | News

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    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

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