• Fulltext


        Click here to view fulltext PDF

      Permanent link:

    • Keywords


      Photoresists; lithographic performance; novolac resins; NMR.

    • Abstract


      Applications of improved 1-D/ 2-D NMR spectroscopic techniques have been reviewed for quantitatively estimating the incorporation of different monomers and degree of linearity in resin microstructure. Comparison of the NMR data with those from lithography leads to a distinct correlation between resin microstructure and lithographic performance. A novel photoresist mechanism is proposed in a positive photoresist; also, using modern NMR techniques, the crosslinking mechanism in a negative photoresist has been studied.

    • Author Affiliations


      Debmalya Roy1 P K Basu1 P Raghunathan2 S V Eswaran3

      1. Solid State Physics Laboratory, Lucknow Road, Delhi 110 054, India
      2. Fluorosis Research Foundation, 34, I.P. Extension, Delhi 110 092, India
      3. St. Stephen’s College, University of Delhi, Delhi 110 007, India
    • Dates

  • Bulletin of Materials Science | News

    • Dr Shanti Swarup Bhatnagar for Science and Technology

      Posted on October 12, 2020

      Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
      Chemical Sciences 2020

      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
      Physical Sciences 2020

    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

© 2021-2022 Indian Academy of Sciences, Bengaluru.