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    • Deposition of TiN/CrN hard superlattices by reactive d.c. magnetron sputtering

      Harish C Barshilia K S Rajam

      Thin Films Volume 26 Issue 2 February 2003 pp 233-237

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      https://www.ias.ac.in/article/fulltext/boms/026/02/0233-0237

    • Keywords

       

      TiN/CrN superlattices; d.c. reactive magnetron sputtering; structural and mechanical properties; nanoindentation; AFM.

    • Abstract

       

      Multilayer superlattice coatings of TiN/CrN were deposited on silicon substrates using a reactive d.c. magnetron sputtering process. Superlattice period, also known as modulation wavelength (𝛬), was controlled by controlling the dwell time of the substrate underneath Ti and Cr targets. X-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) were used to characterize the films. The XRD data showed 1st and 2nd order satellite reflections along the principal reflection for films having 132 Å $\geq \Lambda \geq$ 84 Å, thus confirming the formation of superlattice. The multilayer coatings exhibited hardness (𝐻) as high as 3200 kg/mm2, which is 2 times the rule-of-mixtures value (i.e. $H_{TiN}$ = 2200 kg/mm2 and $H_{CrN}$ = 1000 kg/mm2). Detailed investigations on the effects of various process parameters indicated that hardness of the superlattice coatings was affected not only by modulation wavelength but also by nitrogen partial pressure and ion bombardment during deposition.

    • Author Affiliations

       

      Harish C Barshilia1 K S Rajam1

      1. Surface Engineering Division, National Aerospace Laboratories, Bangalore 560 017, India

    • Dates

       
      Published
      February 2003
      Manuscript received
      26 June 2002
      Manuscript revised
      4 December 2002

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