Click here to view fulltext PDF

Permanent link:
https://www.ias.ac.in/article/fulltext/boms/024/01/0035-0038

Implantation; magnetite; thin films; pulsed laser ablation; Verwey transition.

Highly oriented thin films of Fe₃O₄ were deposited on (100) LaAlO₃ substrates by pulsed laser ablation. The structural quality of the films was confirmed by X-ray diffraction (XRD). The films showed a Verwey transition near 120 K. The films were subjected to 80 keV Ar⁺ implantation at different ion doses up to a maximum of 6 × 10¹⁴ ions/cm². Ion beam induced modifications in the films were investigated using XRD and resistance vs temperature measurements. Implantation decreases the change in resistance at 120 K and this effect saturates beyond 3 × 10¹⁴ ions/cm². The Verwey transition temperature, 𝑇_𝑣, shifts towards lower temperatures with increase in ion dose.

U D Lanke^{1 2}

1. Metallurgical Engineering and Materials Science Department, Indian Institute of Technology, Mumbai 400 076, India
2. School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

Published

February 2001

Manuscript received

17 June 2000

Manuscript revised

14 November 2000