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    • Effect of 80 keV Ar+ implantation on the properties of pulse laser deposited magnetite (Fe3O4) thin films

      U D Lanke

      Review---Phase Transitions Volume 24 Issue 1 February 2001 pp 35-38

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      https://www.ias.ac.in/article/fulltext/boms/024/01/0035-0038

    • Keywords

       

      Implantation; magnetite; thin films; pulsed laser ablation; Verwey transition.

    • Abstract

       

      Highly oriented thin films of Fe3O4 were deposited on (100) LaAlO3 substrates by pulsed laser ablation. The structural quality of the films was confirmed by X-ray diffraction (XRD). The films showed a Verwey transition near 120 K. The films were subjected to 80 keV Ar+ implantation at different ion doses up to a maximum of 6 × 1014 ions/cm2. Ion beam induced modifications in the films were investigated using XRD and resistance vs temperature measurements. Implantation decreases the change in resistance at 120 K and this effect saturates beyond 3 × 1014 ions/cm2. The Verwey transition temperature, 𝑇𝑣, shifts towards lower temperatures with increase in ion dose.

    • Author Affiliations

       

      U D Lanke1 2

      1. Metallurgical Engineering and Materials Science Department, Indian Institute of Technology, Mumbai 400 076, India
      2. School of Chemical and Physical Sciences, Victoria University of Wellington, P.O. Box 600, Wellington, New Zealand

    • Dates

       
      Published
      February 2001
      Manuscript received
      17 June 2000
      Manuscript revised
      14 November 2000

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