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    • Keywords


      MO calculation; plasma enhanced CVD; water repellency

    • Abstract


      Ultra water-repellent films for which contact angles of water drops exceed 150° were prepared by microwave plasma-enhanced CVD using two kinds of organosilicon compound and fluoro-alkyl silane (FAS) at low substrate temperature. Hexamethyldisilane (HMDS) and hexamethyldisiloxane (HMDSO) were used as starting materials. Molecular orbital (MO) calculation suggested that HMDS was more easily decomposable than HMDSO. The films prepared with HMDS and FAS had ultra water repellency. On the other hand, water repellency of the films prepared with HMDSO and FAS was similar to that of polytetrafluoroethylene.

    • Author Affiliations


      Osamu Takai1 Atsushi Hozumi1 Yasushi Inoue1 Takashi Komori1

      1. Department of Materials Processing Engineering, Nagoya University, Chikusa-ku, Nagoya - 464-01, Japan
    • Dates

  • Bulletin of Materials Science | News

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      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
      Physical Sciences 2020

    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

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