• Thermal plasmas in material processing

    • Fulltext


        Click here to view fulltext PDF

      Permanent link:

    • Keywords


      Thermal plasma; plasma devices; material processing; plasma spraying

    • Abstract


      Thermal plasmas are partially ionized gases at atmospheric pressures, characterized by temperatures in the range of 2000–20,000 K and charged particle number densities in the range of 1019–1021 per m3. Thermal plasmas are produced by plasma torches as a highly constricted jet. The high temperatures, enthalpies and heat fluxes in the plasma jet make it amenable to many chemical and metallurgical processes of industrial importance. The processing environment can be inert as in the case of argon or nitrogen plasmas or can be made reactive by introducing suitable gases. Reactive thermal plasma processing is a novel technique, wherein the plasma enters the reaction scheme, with ions and excited species opening up new channels. This technique is versatile in producing a wide variety of materials like oxides, carbides, borides, aluminides and coatings of diamond, superconductors and bioceramics. In this paper, the basic design of the plasma devices and some of the significant materials-related activities carried out recently at BARC are reported.

    • Author Affiliations


      N Venkatramani1

      1. Laser and Plasma Technology Division, Bhabha Atomic Research Centre, Bombay - 400 085, India
    • Dates

  • Bulletin of Materials Science | News

    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

© 2017-2019 Indian Academy of Sciences, Bengaluru.