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    • Keywords


      Tin oxide; reactive evaporation; tetragonal; dislocation defects; recrystallization

    • Abstract


      Stoichiometric polycrystalline tin oxide thin films were deposited by the reactive evaporation of tin and the SnO2 formation was found to be strongly dependent on the deposition parameters. The preferred orientation of the SnO2 films deposited on different substrates was varying due to the dislocation defects arising during the thin film formation. The X-ray diffraction (XRD) studies identified a tetragonal structure while the scanning electron microscopic (SEM) studies revealed a polycrystalline surface for the SnO2 films reactively deposited.

    • Author Affiliations


      Johny T Abraham1 2 Peter Koshy1 V K Vaidyan1 2 P S Mukherjee1 P Guruswamy1 L Prasanna Kumari1

      1. Regional Research Laboratory CSIR, Pappanamcode, Trivandrum - 695 019, India
      2. Department of Physics, University of Kerala, Kariavattom, Trivandrum - 695 581, India
    • Dates

  • Bulletin of Materials Science | News

    • Dr Shanti Swarup Bhatnagar for Science and Technology

      Posted on October 12, 2020

      Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
      Chemical Sciences 2020

      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
      Physical Sciences 2020

    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

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