Ion beam-induced and thermal reactions at Fe:GaAs interface
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Ion beam-induced and thermal reactions at Fe:GaAs interface are studied by using conversion electron Mössbauer spectroscopy and small angle X-ray diffraction measurements. A thin film of Fe (enriched to 30% in57Fe Mössbauer isotope) was deposited in UHV environment on 〈100 〉 oriented semi-insulating GaAs substrates. Some of the samples were ion-mixed by 130 keV Ar+ ions at dose values of 3 × 1015 and 1016 ions/cm2. The asdeposited and ion-mixed samples were annealed at different temperatures up to a maximum of 500° C. It was observed that ion mixing led to precipitation of disordered and/or defective binary phase along with ferromagnetic Fe3GaAs ternary phase which upon vacuum annealing at 500°C for 1 h leads to a mixture of structurally well-defined Fe3Ga, FeAs and FeAs2 phases. The combined analysis of Mössbauer and X-ray data is shown to reveal the location of the phases below the sample surface. The mechanism for phase formation and associated reaction kinetics at Fe/GaAs interface is discussed in the light of the experimental results.
Volume 43, 2020
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Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
Chemical Sciences 2020
Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
Physical Sciences 2020
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