• Laser etching and dry processing

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    • Keywords


      Laser; etching process

    • Abstract


      Controlled, anisotropic etching of different materials commonly used in microelectronics is an important processing step in microfabrications. During recent years it has been demonstrated that lasers can be used for initiating and enhancing the etching process in many gas-solid (dry processing) and liquid-solid (wet processing) systems. The laser-induced reaction could be either photochemical or thermochemical. Using laser etching technique a variety of materials such as Al, Ta, Ni/Fe, GaAs, InP, Si, SiO2 mylar, different polymers and superconducting materials have been processed. In this paper we briefly review these laser etching experiments.

    • Author Affiliations


      A K Nath1

      1. Laser Programme, Centre for Advanced Technology, Indore - 452 012, India
    • Dates

  • Bulletin of Materials Science | News

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      Prof. Subi Jacob George — Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bengaluru
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      Prof. Surajit Dhara — School of Physics, University of Hyderabad, Hyderabad
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