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      https://www.ias.ac.in/article/fulltext/boms/006/06/1029-1033

    • Keywords

       

      Tin dioxide films; electron beam evaporation; annealing behaviour; sheet resistivity

    • Abstract

       

      The sheet resistivity of tin dioxide films deposited by electron-beam evaporation has been studied during annealing, both as a function of time and temperature. The annealing behaviour of SnO2 films under the above two different conditions is consistent. A qualitative interpretation has been given for the decrease and the minimum observed in the resistivity. The increase in resistivity has been confirmed by scanning-electron micrographs. The films were also characterized by x-ray diffractometry.

    • Author Affiliations

       

      Arjeesh Gupta1 Poonam Gupta1 V K Srivastava1

      1. Department of Physics, University of Roorkee, Roorkee - 247 672, India
    • Dates

       
  • Bulletin of Materials Science | News

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