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    • Keywords


      rf sputtering; target; shield; Crookes dark space; amorphous films; scanning electron microscopy; transmission electron microscopy

    • Abstract


      A new method ofrf sputtering by which thin films of metals, semiconductors and insulators can be sputtered from their respective powders, has been successfully demonstrated. The films have been characterized for their surface and crystal structure using conventional methods ofsem andtem. All the films are amorphous with a relatively smooth surface topography. The relative merits and demerits of the technique have been briefly discussed.

    • Author Affiliations


      K Solomon Harshavardhan1 K N Krishna1

      1. Materials Research Laboratory, Indian Institute of Science, Bangalore - 560 012, India
    • Dates

  • Bulletin of Materials Science | News

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      Posted on July 25, 2019

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