• Electroless deposition of Alpha-PbO2 and Tl2O3

    • Fulltext


        Click here to view fulltext PDF

      Permanent link:

    • Keywords


      Lead oxide; thallium oxide; thin film; chemical deposition

    • Abstract


      A chemical method for electroless deposition of thin film ofa-PbO2 and Tl2O3 has been developed. The deposition has been performed by ammonia, persulfate ion and metal ions at a higher temperature. The electrical resistance, mobility and carrier concentration have been measured with variation of thickness of the films. Optical absorption spectra reveal the band edges which are 1·7 eV and 1·95 eV ofa-PbO2 and Tl2O3 respectively.

    • Author Affiliations


      R N Bhattacharya1 P Pramanik1

      1. Department of Chemistry, Indian Institute of Technology, Kharagpur - 721 302, India
    • Dates

  • Bulletin of Materials Science | News

    • Editorial Note on Continuous Article Publication

      Posted on July 25, 2019

      Click here for Editorial Note on CAP Mode

© 2017-2019 Indian Academy of Sciences, Bengaluru.