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journal of science education

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Photoresists for Microlithography

1. Role of Organic Chemistry in Microelectronics

Debmalya Roy, P K Basu and S V Eswaran


Debmalya Roy P K Basu
S V Eswaran

Debmalya Roy is working in interdisciplinary area in organic chemistry and trying to balance the academic and technological aspects of the subject. Apart from his fascination for Rabindranath Tagore and science, instrumental music and sports are his other interests.

Pradeep Kumar Basu has worked on bipolar IC’s, MOSFET’s, CCD’s and MCT based IR devices. His primary hobby is reading various subjects, scientific or otherwise and listening to music both Indian and western: classical and modern.

S V Eswaran has worked on lac resin, heterocycles and nitrene-carbene conversion. Chemical education is his passion and his hobbies include reading, music, cricket and tennis.

 

Photoresist technology, which is used for micro-pattern-ing exploits changes in properties of polymeric materials, such as their solubility or volatility, upon photo-irradiation. This process has greatly benefitted from the knowledge base of organic chemistry and photo-induced organic transformations. The role of chemistry in the development of photoresists is described in this article.

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Address for Correspondence
Debmalya Roy, P K Basu
Solid State Physics Laboratory,
Lucknow Road
Delhi 110054, India.

S V Eswaran
Principal,
Deshbandhu College,
University of Delhi Kalkaji
New Delhi 110019, India.


Indian Academy of Sciences


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