Debmalya Roy is working in interdisciplinary area in organic chemistry and trying to balance the academic and technological aspects of the subject. Apart from his fascination for Rabindranath Tagore and science, instrumental music and sports are his other interests.

Pradeep Kumar Basu has worked on bipolar IC’s, MOSFET’s, CCD’s and MCT based IR devices. His primary hobby is reading various subjects, scientific or otherwise and listening to music both Indian and western: classical and modern.

S V Eswaran has worked on lac resin, heterocycles and nitrene-carbene conversion. Chemical education is his passion and his hobbies include reading, music, cricket and tennis.

Characteristics of photoresists used in microlithography are highlighted. The microstructure of the matrix polymer used in these photoresists is critical for ensuring good lithographic performance and the same can be evaluated by using modern NMR spectroscopic techniques. It is now well-known that highly ordered ‘alternate’ and ‘semi-alternate’ tailor-made novolaks lead to better performing photoresists.

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Address for Correspondence
Debmalya Roy, P K Basu
Solid State Physics Laboratory,
Lucknow Road
Delhi 110054, India.

S V Eswaran
Principal,
Deshbandhu College,
University of Delhi Kalkaji
New Delhi 110019, India.